Method for producing optical lens

ABSTRACT

A method for producing an optical lens includes: forming a mark outside a lens region set in a lens substrate, the mark being adapted to perform position alignment; pattern-forming a masking layer above one principal surface of the lens substrate while controlling formation position of the masking layer with the mark as a reference, the masking layer having an aperture at a predetermined position in the lens region; performing a selective process with respect to a surface exposed from the bottom of the aperture of the masking layer by performing a process from above the masking layer; and removing the masking layer from above the lens substrate to form a processed pattern by the selective process on the side of the one principal surface of the lens substrate.

TECHNICAL FIELD

The present invention relates to a method for producing an optical lens,more particularly to a method for producing an optical lens whichincludes a step of forming a pattern on a lens surface.

BACKGROUND ART

A spectacle lens has various films coated on a lens substrate thereof.Examples of the various films include a hard coat film, anantireflection film, a water-repellent film and the like, wherein thehard coat film is adapted to prevent the lens substrate from beingscratched, the antireflection film is adapted to prevent light frombeing reflected by lens surface, and the water-repellent film is adaptedto prevent water spotting on the lens. Apart from the aforesaidconfiguration, another configuration is proposed in which, as a film forreducing the amount of the light incident on the eye of the wearer ofthe spectacles, a semi-transmissive thin film is coated on the entiresurface of the lens in a dot-like manner, and an antireflection film iscoated on the semi-transmissive thin film (see Patent document 1, forexample).

In recent years, a plastic lens light in weight and excellent in dyeingaffinity is favorably used as a high-fashion spectacle lens; andfurther, in order to improve the designability, a configuration isproposed in which a pattern is formed on the lens by applying apigmented coating on the lens using an inkjet method.

PRIOR ART DOCUMENTS Patent Documents

-   Patent document 1: Japanese Unexamined Patent Application    Publication No. 2008-55253-   Patent document 2: WO00-67051 (particularly page 7)

DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention

However, in the case where a pattern is formed on the lens to improvethe designability, for example, if the aforesaid method is employed inwhich a pigmented coating is simply coated on the lens using an inkjetmethod, it is possible to control the position where the pattern is tobe formed, however the material constituting the pattern is limited tomaterials applicable to the inkjet method. Thus, the inkjet method cannot be employed to form a pattern using a material, such as an inorganicmaterial, unfit for forming ink, and therefore such a method lacksversatility.

Therefore, it is an object of the present invention to provide a methodfor producing an optical lens in which a processed pattern can beaccurately formed on a lens surface at a predetermined position of thelens substrate without limiting the material.

Means for Solving the Problems

To achieve the aforesaid object, a method for producing an optical lensaccording to an aspect of the present invention includes the followingsteps: first, forming a mark outside a lens region set in a lenssubstrate, wherein the mark is adapted to perform position alignment;then, pattern-forming a masking layer above one principal surface of thelens substrate while controlling formation position of the masking layerwith the mark as a reference, wherein the masking layer has an apertureat a predetermined position in the lens region; thereafter, performing aselective process with respect to a surface exposed from the bottom ofthe aperture of the masking layer by performing a process from above themasking layer; and then, removing the masking layer from above the lenssubstrate to form a processed pattern by the selective process on theside of the one principal surface of the lens substrate.

With such a producing method, by performing the process from above thepattern-formed the masking layer, the processed pattern is formed on thesurface exposed from the bottom of the aperture of the masking layer.Thus, by performing the pattern-forming of the masking layer using amethod accurate in position and shape (such as an inkjet method, forexample), the processing method for forming the processed pattern may beany one selected from a wide range of processing methods, instead ofbeing limited to a method accurate in position and shape, to obtainaccurate processed pattern.

In the aforesaid producing method, in the step of performing theselective process, a process for forming a transparent material film isperformed. In such a case, in the step of removing the masking layer,the transparent material film formed on the masking layer is removedalong with the masking layer. Thus, a transparent pattern formed of thetransparent material film, as the processed pattern, is formed only onthe surface exposed from the bottom of the aperture of the maskinglayer. By performing such process, the transparent pattern can beaccurately formed on the lens substrate.

In the aforesaid producing method, as another example of the step ofperforming the selective process, a dyeing process with respect tobottom of the aperture of the masking layer may be performed. In such acase, a dyeing pattern is formed as the processed pattern. By performingsuch a process, a dyeing pattern can be accurately formed at least inthe surface layer of the lens substrate.

In the aforesaid producing method, it is preferred that a modificationtreatment with respect to the surface of a base of the masking layer isperformed before the step of forming the masking layer by an inkjetmethod, wherein the modification treatment is adapted to ensurewettability of the base with respect to the ink constituting the maskinglayer. Thus, it is possible to form a masking layer, as a homogenouscontinuous film, in the inkjet method to be performed next; and in thecase where a process is performed from above the masking layer, it ispossible to accurately form a processed pattern only within the apertureof the masking layer.

Advantages of the Invention

With the aforesaid method for producing an optical lens, it is possibleto accurately form a processed pattern at a predetermined position onthe lens substrate using a treatment method with wide selection, withoutlimiting the material.

BRIEF DESCRIPTION OF DRAWINGS

FIGS. 1A and 1B are respectively a plan view and a cross-sectional viewshowing the configuration of an optical lens produced by a methodaccording to a first embodiment;

FIG. 2 is a flowchart showing a producing procedure of the optical lensof the first embodiment;

FIGS. 3A, 3B and 3C are producing process drawings (part one) showingthe producing procedure of the optical lens according to the firstembodiment;

FIGS. 4A and 4B are producing process drawings (part two) showing theproducing procedure of the optical lens according to the firstembodiment;

FIGS. 5A, 5B and 5C are producing process drawings (part three) showingthe producing procedure of the optical lens according to the firstembodiment;

FIGS. 6A and 6B are respectively a plan view and a cross-sectional viewshowing the configuration of an optical lens produced by a methodaccording to a second embodiment;

FIGS. 7A and 7B are respectively a plan view and a cross-sectional viewshowing the configuration of an optical lens produced by a methodaccording to a third embodiment;

FIG. 8 is a flowchart showing a producing procedure of the optical lensof the third embodiment;

FIGS. 9A and 9B are producing process drawings (part one) showing theproducing procedure of the optical lens according to the thirdembodiment;

FIGS. 10A and 10B are producing process drawings (part two) showing theproducing procedure of the optical lens according to the thirdembodiment;

FIGS. 11A and 11B are respectively a plan view and a cross-sectionalview showing the configuration of an optical lens produced by a methodaccording to a fourth embodiment;

FIG. 12 is a flowchart showing a producing procedure of the optical lensof the fourth embodiment;

FIGS. 13A and 13B are producing process drawings (part one) showing theproducing procedure of the optical lens according to the fourthembodiment;

FIGS. 14A, 14B and 14C are producing process drawings (part two) showingthe producing procedure of the optical lens according to the fourthembodiment; and

FIGS. 15A and 15B are respectively a plan view and a cross-sectionalview showing the configuration of an optical lens produced by a methodaccording to a fifth embodiment.

MODES FOR CARRYING OUT THE INVENTION

Embodiments of the present invention will be described in the followingorder based on the attached drawings.

1. First embodiment (an example in which an island-like transparentpattern is formed between an antireflection film and a lens substrate)2. Second embodiment (an example in which a transparent pattern havingan aperture is formed between the antireflection film and the lenssubstrate)3. Third embodiment (an example in which an island-like transparentpattern is formed above the antireflection film).4. Fourth embodiment (an example in which an island-like dyed pattern isformed on a surface layer of the lens substrate).5. Fourth embodiment (an example in which a dyed pattern having anaperture is formed on the surface layer of the lens substrate).

Note that, in the aforesaid embodiments, the same components are denotedby the same reference numerals, and the explanation thereof will not berepeated.

1. First Embodiment <Configuration of Optical Lens According to FirstEmbodiment>

FIGS. 1A and 1B are views for explaining the configuration of an opticallens 1 a according to a first embodiment, wherein FIG. 1A is a planview, and FIG. 1B is a cross section taken along line a-a′ of FIG. 1A.The optical lens 1 a of the first embodiment shown in FIGS. 1A and 1B isfavorable to be used as a spectacle lens, for example, and is configuredas below.

To be specific, the optical lens 1 a has a hard coat film 13, anantireflection film 15 and a water-repellent film 17 laminated, in thisorder, to one principal surface of a lens substrate 11 thereof.Particularly, one characteristic of the optical lens 1 a of the firstembodiment is that an island-like transparent pattern 19 a, as aprocessed pattern, is provided between the hard coat film 13 and theantireflection film 15 formed on lens substrate 11. The detailconfiguration of the components constituting the optical lens 1 a willbe described below in the order from the lens substrate 11.

[Lens Substrate 11]

The lens substrate 11 is formed into a predetermined lens shape by usinga plastic material commonly used for producing optical lenses. Therefractive index of the plastic material is (nD) 1.50 to 1.74, forexample. Examples of such plastic material include allyl diglycolcarbonate, urethane resin, polycarbonate, thiourethane resin, andepisulfide resin. Here, when the optical lens 1 a is used to configure apair of spectacles, the surface of the lens substrate 11 that forms thefront side of the spectacles is defined as a “one principal surface”;and the aforesaid layers (i.e., the films from the hard coat film 13 tothe water-repellent film 17, and the transparent pattern 19 a) arelaminated to the one principal surface.

[Hard Coat Film 13]

The hard coat film 13 is used as the base of the antireflection film 15,and is formed of a material containing an organosilicon compound, forexample. The refractive index of the hard coat film 13 is close to therefractive index of the aforesaid plastic material. To be specific, thehard coat film 13 has a refractive index of about (nD) 1.49 to 1.70, andfilm configuration is selected according to the material of the lenssubstrate 11.

[Antireflection Film 15]

The antireflection film 15 has a multi-layer structure formed bylaminating a plurality of material films one upon another wherein theplurality of material films each have different refractive index, and isadapted to prevent light reflection by interference. Examples of theantireflection film 15 include the one which has a multi-layer structureformed by alternately laminating a low refractive index film 15 a and ahigh refractive index film 15 b one upon another. The low refractiveindex film 15 a is formed of, for example, silica dioxide (SiO₂) whichhas a refractive index of about 1.43 to 1.47. The high refractive indexfilm 15 b is formed of a material having a refractive index higher thanthe refractive index of the low refractive index film 15 a, wherein suchmaterial is composed of, at a proper rate, a plurality of metal oxidessuch as niobium oxide (Nb₂O₅), tantalum oxide (Ta₂O₅), titanium oxide(TiO₂), zirconium oxide (ZrO₂), yttrium oxide (Y₂O₃), aluminum oxide(Al₂O₃) and the like.

In the antireflection film 15 formed of the low refractive index film 15a and the high refractive index film 15 b, the number of the laminatedlayers is not particularly limited. As an example, the antireflectionfilm 15 may be formed by laminating seven layers of refractive indexfilms, which are a low refractive index film 15 a-1, a high refractiveindex film 15 b-2, . . . a low refractive index film 15 a-7, one uponanother in this order from the side of the lens substrate 11. The filmthickness of each low refractive index film 15 a and each highrefractive index film 15 b is set according to each refractive index sothat a predetermined phase difference is obtained.

As an example, the antireflection film 15 may have a film configurationin which the film thickness of the low refractive index film 15 a andthe film thickness of the high refractive index film 15 b are setaccording to the refractive index thereof so that, in the order from theside of the lens substrate 11, the combined phase difference of threelayers of “low refractive index film 15 a-1/high refractive index film15 b-2/low refractive index film 15 a-3” is [λ/4], the combined phasedifference of three layers of “high refractive index film 15 b-4/lowrefractive index film 15 a-5/high refractive index film 15 b-6” is[λ/2], and the phase difference of one layer of “low refractive indexfilm 15 a-7” is [λ/4].

[Water-Repellent Film 17]

The water-repellent film 17 is formed of, for example, an organosiliconcompound having a fluorine-substituted alkyl group. The film thicknessof the water-repellent film 17 is set so that antireflection function isexhibited in combination with the antireflection film 15.

[Transparent Pattern 19 a]

The transparent pattern 19 a is provided as an ornamental pattern, logo,character or the like, and is configured as an island-like patternformed of a light transmissive material. The transparent pattern 19 aused in the first embodiment needs to have transparency with respect tovisible light, for example; and it is particularly preferred that therefractive index of the transparent pattern 19 a is higher than therefractive indexes of the layers that sandwich the transparent pattern19 a. The film thickness of the transparent pattern 19 a is suitablyadjusted based on both the refractive index of the material constitutingthe transparent pattern 19 a and the required visibility of thetransparent pattern 19 a when viewed from the side of thewater-repellent film 17. Incidentally, the transparent pattern 19 a mayalso be formed by laminating a plurality of different material layersone upon another.

The material used to form the transparent pattern 19 a has a refractiveindex higher than both the refractive index of the hard coat film 13 andthe refractive index of the low refractive index film 15 a-1, whichsandwich the transparent pattern 19 a in between. The material identicalto the material constituting the high refractive index film 15 b of theantireflection film 15 is preferably used as the material of thetransparent pattern 19 a. In the case where such material is used toform the transparent pattern 19 a, the film thickness of the transparentpattern 19 a is about 10 nm. With such a configuration, it is possibleto obtain a high visibility of the transparent pattern 19 a when viewingthe lens from the side of the water-repellent film 17. Incidentally, ifit is purposely to obtain a low visibility of the transparent pattern 19a, all things that need to be done is to adjust the refractive index andfilm thickness of the transparent pattern 19 a.

In the optical lens 1 a having the aforesaid configuration, a hard coatfilm, an antireflection film and a water-repellent film may also belaminated to the optical lens 1 a on the surface that forms the innerside of the spectacles configured by the optical lens 1 a (i.e., on thesurface facing the wearer) one on another in this order from the side ofthe lens substrate 11.

<Method for Producing Optical Lens of First Embodiment>

FIG. 2 is a flowchart showing a producing procedure of the optical lensof the first embodiment having the aforesaid configuration. FIGS. 3A to5C are producing process drawings showing the producing procedure of theoptical lens of the first embodiment having the aforesaid configuration.The producing procedure of the optical lens of the first embodiment willbe described below based on these drawings, in the case where theoptical lens is applied to spectacles.

First, as shown in FIGS. 3A to 3C, reference marks m1 to m4 forperforming position alignment are formed outside the lens region of thelens substrate (S 1). Such step is performed as below.

[FIG. 3A]

First, as shown in FIG. 3A, the lens substrate 11 is prepared. Thefollowing description is based an example in which the lens substrate isa spectacle single-vision lens.

A geometric center G.C and an optical center O.C are determined for thelens substrate 11 by measurement. Further, tentative dot marks M1 to M3,which show optical coordinates including the optical center O.C, aremarked on the side of the one principal surface of the lens substrate11. The dot marks M1 to M3 are marked using red ink, for example. As anexample, the optical center 0.0 is regarded as the center dot mark M2,and the dot marks M1, M3 are arranged respectively on the right side andleft side of the center dot mark M2 at two points apart from the centerdot mark M2 by equal distance.

[FIG. 3B]

Next, as shown in FIG. 3B, the position of the center (frame center) F.Cof a contour shape F of the lens substrate 11 is detected based on boththe data of the three-dimensional contour shape F of the optical lenscreated according to the order and the optical coordinates indicated bythe dot marks M1 to M3 on the lens substrate 11.

[FIG. 3C]

Thereafter, as shown in FIG. 3C, based on the relationship between theoptical center 0.0 and the frame center F.C, the contour shape F of alens region is determined with respected to the lens substrate 11.Further, based on the dot marks M1 to M3 which indicate the opticalcoordinates, the reference marks m1 to m4 are formed on the lenssubstrate 11, wherein the reference marks m1 to m4 serve as a referenceof the contour shape F. The reference marks m1 to m4 are designed sothat the upper side, lower side, right side and left side of the lenscan be distinguished. Further, it is preferred that the reference marksm1 to m4 are designed so that it is possible to distinguish whether thelens is a right lens or a left lens of the spectacles. For example, thereference marks m2, m4, which indicate the right and left, are marked asarrows pointing to the center of the spectacles.

Further, the reference marks m1 to m4 are marked at the points outsidethe lens region surrounded by the contour shape F. Thus, aftershape-cutting the lens substrate 11 to match the contour shape F, thereference marks m1 to m4 marked on the lens will not be left.Incidentally, the drawing shows a case where the reference marks m1 tom4 are laid out with the optical center 0.0 as a reference. However, thereference marks m1 to m4 may also be laid out with the frame center F.Cas a reference.

The aforesaid reference marks m1 to m4 are directly formed on the oneprincipal surface of the lens substrate 11 by, for example, a lasermarker. At this time, laser is irradiated on the lens substrate 11,wherein the power of the laser is set to a level so that the lenssubstrate 11 will not be damaged due to the heat influence.Incidentally, the reference marks m1 to m4 do not have to be formed by alaser marker, but may also be formed by other methods such an inkjetmethod. At this time, it is important to select a material as the inkfor forming the marks, so that the marks will not be removed togetherwith a masking layer when performing a masking layer removing step(which is to be described later). Further, the reference marks m1 to m4may also be formed by writing a marking-off mark by hand, for example.

The process for forming the reference marks m1 to m4 described above isbased an example in which the lens substrate 11 is a single-vision lens.However, the lens substrate 11 does not have to be a single-vision lens,but may also be a multi-focal lens, a progressive-addition lens or otherlens. In the case where a multi-focal lens is used, the frame center F.Cis detected with the vertex of a portion called “segment” as areference, so as to determine the contour shape F and form the referencemarks m1 to m4. In the case where a progressive-addition lens is used,the frame center F.C is detected with a hidden mark (layout referencemark) as a reference, so as to determine the contour shape F and formthe reference marks m1 to m4. Further, in the case where aprogressive-addition lens is used, a prism reference point is regardedas the center dot mark M2, and the dot marks M1, M3 are arrangedrespectively on the right side and left side of the center dot mark M2at two points apart from the center dot mark M2 by equal distance, andthe reference marks m1 to m4 may be laid out based on the dot marks M1to M3.

After the reference marks m1 to m4 are formed, the dot marks M1 to M3are rubbed off.

[FIG. 4A, FIG. 4B]

After the reference marks m1 to m4 have been formed in the aforesaidmanner, the hard coat film 13 is formed on the lens substrate 11 asshown in the plan view of FIG. 4A and the cross sectional view of FIG.4B (equivalent to a cross section taken along line a-a′ of FIG. 4A)(S2). The hard coat film 13 is formed by, for example, a dipping methodusing a solution having an organosilicon compound dissolved therein.

Next, a modification treatment is performed for the surface of the hardcoat film 13 (S3). As the modification treatment, a treatment forensuring wettability of the surface of the hard coat film 13 withrespect to the ink to be used for forming the masking layer in the nextstep is performed. Here, as a treatment method that does not causedamage to the surface of the hard coat film 13, a plasma treatment usingan oxygen plasma is performed, for example. Incidentally, themodification treatment for ensuring wettability does not have to belimited to the plasma treatment, but may also be other methods as longas such methods do not caused damage to the hard coat film 13; forexample, the modification treatment may also be an ion irradiationtreatment, a corona discharge treatment, an alkali treatment or thelike.

Next, an inkjet method is used to pattern-form the masking layer 21 fromabove the side of the one principal surface of the lens substrate 11(i.e., the hard coat film 13 having been subjected to the modificationtreatment is regarded as a base, and the inkjet method is used topattern-form the masking layer 21 on the surface of the base) (S4). Themasking layer 21 formed here covers the entire contour shape F of theoptical lens, and has an aperture pattern 21 a that corresponds to thetransparent pattern to be formed on the optical lens, wherein thecontour shape F is established on the side of the one principal surfaceof the lens substrate 11. Incidentally, it is preferred that the shapeof the masking layer 21 is several millimeters larger than the contourshape F, so that error caused when shape-cutting the lens substrate 11to match the contour shape F can be absorbed.

At this time, it is important to arrange the aperture pattern 21 a at apredetermined position on the lens substrate 11 preset based on thepreviously-created reference marks m1 to m4 to print and form themasking layer 21, without being affected by the curve of the lenssubstrate 11. To achieve this purpose, the masking layer 21 is formedusing an inkjet method. The inkjet method used here is not particularlylimited in type and method, but may either be a continuation type or anon-demand type; and if the inkjet method is an on-demand type, it mayeither be a piezo method or a thermal method.

Here, the ink used to form the masking layer 21 by the inkjet method isan ultraviolet cure ink (UV cure ink), for example. The ink used herecan be selectively removed with respect to the hard coat film 13 evenafter being cured. Examples of such ink include so-called a hard UV inkand a soft UV ink, both of which are adapted to be applied to ahigh-adhesion/high adhesiveness non-absorbable material and can beremoved by being dissolved in ethanol, acetone or the like after beingcured.

In the inkjet method using such ink, it is important to adjust printingconditions to thereby form the masking layer 21 as a continuous filmwithout uneven coating. Examples of the printing conditions includemoving speed of the lens substrate with respect to the print head,resolution in moving direction, resolution in width directionperpendicular to the moving direction, size of ink droplet, dropfrequency of ink droplet, number of the ink droplets dropped to the samepoint-of-impact, and the like. Since these printing conditions arecorrelated to each other, the masking layer 21 without uneven print isformed by suitably adjusting the printing conditions.

After the masking layer 21 has been formed using the aforesaid inkjetmethod, ultraviolet light (UV) is irradiated on the masking layer 21 tothereby cure the ink constituting the masking layer 21.

[FIG. 5A]

Next, as shown in FIG. 5A, a transparent material film 19 is formed fromabove the masking layer 21 (S5). By performing such step, a film-formingtreatment is selectively performed with respect to the surface of thehard coat film 13 exposed from the bottom of the aperture pattern 21 aof the masking layer 21. Here, an evaporation method is used to form thetransparent material film 19 at a predetermined film thickness (forexample, 10 nm), wherein the transparent material film 19 is formed oftantalum oxide (Ta₂O₅) and has a refractive index of 2.05 to 2.15, forexample. When forming film, it is preferred that an ion assisteddeposition is performed to thereby form the transparent material film 19with excellent film-quality and adhesion.

[FIG. 5B]

Next, as shown in FIG. 5B, a treatment is performed to remove themasking layer 21 from above the hard coat film 13, so that thetransparent material film 19 above the masking layer 21 is selectivelyremoved along with the masking layer (S6). Here, the masking layer 21 isremoved by performing, for example, a wet process using a solvent(ethanol, acetone or the like) to dissolve the masking layer 21. Byperforming such process, only the part of the transparent material film19 formed within the aperture pattern 21 a of the masking layer 21remains on the lens substrate 11 through the hard coat film 13, and theremaining part of the transparent material film 19 is formed as thetransparent pattern 19 a on the lens substrate 11. The transparentpattern 19 a formed in such manner is formed at the same position andwith the same shape as the aperture pattern 21 a formed in the maskinglayer 21.

[FIG. 5C]

Next, as shown in FIG. 5C, the antireflection film 15 is formed on thehard coat film 13 on which the transparent pattern 19 a has been formed,and further, the water-repellent film 17 is formed on the antireflectionfilm 15, wherein the antireflection film 15 has a multi-layer structureformed by alternately laminating the low refractive index film 15 a andthe high refractive index film 15 b one upon another (S7). Theantireflection film 15 is formed by performing ion assisted depositionto thereby form respective layers one upon another, with eachcomposition and each film thickness, in the order from the lowrefractive index film 15 a-1, which is arranged on the side of theunderlying layer, to the low refractive index film 15 a-7.

[FIG. 1A, FIG. 1B]

Thereafter, as shown in FIGS. 1A and 1B, the lens substrate 11, whichhas various layers up to the water-repellent film 17 formed thereon, isshape-cut to match the contour shape F determined with respect to thelens substrate 11 (S8). At this time, as shown in FIG. 4A, a processingjig is absorbed onto the lens substrate 11 at a predetermined positionaligned based on the reference marks m1 to m4 formed outside the contourshape F of the lens substrate 11, so that the lens substrate 11 is fixedto the processing jig. In such a state, a shape-cutting machine is usedto shape-cut the lens substrate 11 into the contour shape F alignedbased on the reference marks m1 to m4, and then the processing jig isdetached to complete the optical lens 1 a. Then, after performing anappearance inspection, the optical lens 1 a is shipped.

<Advantages of First Embodiment>

In the aforesaid method for producing the optical lens according to thefirst embodiment, as described with reference to FIG. 5A, by performingthe film-forming treatment from above the masking layer 21, thetransparent pattern 19 a, as a processed pattern, is formed within theaperture of the masking layer 21. Thus, the transparent pattern 19 a canbe formed by a material suitable for forming film by an evaporationmethod. Further, the transparent pattern 19 a (i.e., the processedpattern) is formed on the lens substrate 11 in the portion exposed fromthe bottom of the aperture pattern 21 a formed in the masking layer 21.Thus, the transparent pattern 19 a (processed pattern) with highposition accuracy and high shape accuracy can be obtained following theforming accuracy of the masking layer 21 by the inkjet method. As aresult, it is possible to form the transparent pattern 19 a, as aprocessed pattern with high accuracy, at a predetermined position on thelens substrate 11, wherein the transparent pattern 19 a is formed of amaterial which is though not suitable to be used to form a pattern byhigh-accuracy pattern-forming methods such as an inkjet method, forexample, but is suitable to be used to form a film by film-formingmethods such as an evaporation method.

In the optical lens 1 a having the configuration of the first embodimentobtained in the aforesaid manner, by laminating the transparent pattern19 a to the antireflection film 15 with the multi-layer structure, thelight reflection characteristic of the light incident to the opticallens 1 a from the side of the antireflection film 15 is differentbetween the portion where the transparent pattern 19 a is formed and theportion where the transparent pattern 19 a is not formed. Thus, whenviewing the lens 1 a through the water-repellent film 17 from the sideof the antireflection film 15, the antireflection function of theantireflection film 15 can be maintained, yet the transparent pattern 19a can be easily viewed as the aforesaid difference of the lightreflection characteristic. On the other hand, in the case where theoptical lens 1 a is used to form a pair of spectacles and where theoptical lens 1 a is viewed at a very close distance from the side of thewearer of the spectacles (i.e., from the side opposite theantireflection film 15 and the water-repellent film 17), the transparentpattern 19 a is not easily viewed.

As a result, by using the optical lens 1 a, it is possible to configurea pair of spectacles excellent in design by forming the transparentpattern 19 a as an ornamental pattern, logo, character or the like, forexample, wherein the transparent pattern 19 a can be viewed fromoutside, while the field of vision of the wearer can be ensured withoutdiscomfort.

According to the first embodiment, the transparent pattern 19 a isarranged between the lens substrate 11 and the antireflection film 15,more particularly, between the hard coat film 13 and the low refractiveindex film 15 a-1, which constitutes the antireflection film 15. Withsuch a configuration, it is possible to obtain a normal lensconfiguration in which the surface of the lens substrate 11 on the sideof the one principal surface is evenly covered by the antireflectionfilm 15, without impairing the continuity of the layer structure of theantireflection film 15. Thus, the surface of the antireflection film 15can be evenly covered by the low refractive index film 15 a-7, which isformed of a material excellent in abrasion resistance such as silicadioxide (SiO2), so that it is possible to form a lens configuration lesssusceptible to damage. Further, continuity of the process when formingthe antireflection film 15 with the multi-layer structure is also notimpaired.

Further, in such a configuration, if the refractive index of thetransparent pattern 19 a is higher than both the refractive indexes ofboth the hard coat film 13 and the low refractive index film 15 a-1,which sandwich the transparent pattern 19 a, the visibility of thetransparent pattern 19 a when viewing the optical lens 1 a from the sideof the antireflection film 15 can be improved even if the transparentpattern 19 a is a thin film with a single layer structure. For example,in the case where the transparent pattern 19 a is formed by a singlelayer of tantalum oxide (Ta₂O₅) having a film thickness of 10 nm,one-side luminous reflectance viewed from the side of the antireflectionfilm 15 is 1.624% in the portion where the transparent pattern 19 a isformed and 0.545% in the portion where the transparent pattern 19 a isnot formed, so that it is confirmed that sufficient visibility of thetransparent pattern 19 a can be obtained.

2. Second Embodiment <Configuration of Optical Lens According to SecondEmbodiment>

FIGS. 6A and 6B are views for explaining the configuration of an opticallens 1 b according to a second embodiment, wherein FIG. 6A is a planview, and FIG. 6B is a cross section taken along line a-a′ of FIG. 6A.The optical lens 1 b of the second embodiment shown in these drawings isidentical to the optical lens (1 a) of the first embodiment except thata transparent pattern 19 b formed as a processed pattern whichconstitutes an ornamental pattern, logo, character or the like isconfigured as a punched pattern having an aperture h.

The transparent pattern 19 b having the aperture h may have the sameconfiguration as that of the island-like transparent pattern (19 a)described in the first embodiment except for the planar shape. To bespecific, the transparent pattern 19 b needs to have transparency withrespect to visible light, for example; and it is particularly preferredthat the refractive index of the transparent pattern 19 b is higher thanthe refractive indexes of the layers that sandwich the transparentpattern 19 b. The transparent pattern 19 b has a film thickness which issuitably adjusted based on both the refractive index of the materialconstituting the transparent pattern 19 b and the required visibility ofthe transparent pattern 19 b when viewed from the side of thewater-repellent film 17, and further, the transparent pattern 19 b mayalso be formed by laminating a plurality of different material layersone upon another.

<Method for Producing Optical Lens of Second Embodiment>

The method for producing the optical lens 1 b of the second embodimenthaving the aforesaid configuration is identical to that of the firstembodiment. However, in the process for forming the masking layer 21described with reference to FIGS. 4A and 4B, a masking layer having areversed pattern may be formed by using a high-accuracy pattern-formingmethod such as an inkjet method, for example.

<Advantages of Second Embodiment>

Similar to the producing method of the first embodiment, in the secondembodiment, since the same method as the first embodiment is used, it isalso possible to form the transparent pattern 19 b, as a processedpattern with high accuracy, at a predetermined position on the lenssubstrate 11, wherein the transparent pattern 19 b is formed of amaterial which is though not suitable to be used to form a pattern byhigh-accuracy pattern-forming methods such as an inkjet method, forexample, but is suitable to be used to form a film by film-formingmethods such as an evaporation method.

The optical lens 1 b of the second embodiment has the same configurationas that of the optical lens of the first embodiment, i.e., thetransparent pattern 19 b is laminated between the hard coat film 13 andthe low refractive index film 15 a-1 of the antireflection film 15.Thus, similar to the first embodiment, by using the optical lens 1 b, itis possible to configure a pair of spectacles excellent in design byforming the transparent pattern 19 b as an ornamental pattern, logo,character or the like, for example, wherein the transparent pattern 19 bcan be viewed from outside, while the field of vision of the wearer canbe ensured without discomfort; and continuity of the process whenforming the antireflection film 15 with the multi-layer structure isalso not impaired by providing the transparent pattern 19 b. Further,similar to that described in the first embodiment, if the refractiveindex of the transparent pattern 19 b is higher than the refractiveindexes of both the hard coat film 13 and the low refractive index film15 a-1 of the antireflection film 15, which sandwich the transparentpattern 19 b, the visibility of the transparent pattern 19 b whenviewing the optical lens 1 b from the side of the antireflection film 15can be improved even if the transparent pattern 19 b is a thin film witha single layer structure.

3. Third Embodiment <Configuration of Optical Lens According to ThirdEmbodiment>

FIGS. 7A and 7B are views for explaining the configuration of an opticallens 1 c according to a third embodiment, wherein FIG. 7A is a planview, and FIG. 7B is a cross section taken along line a-a′ of FIG. 7A.The optical lens is of the third embodiment shown in these drawingsdiffers from the optical lenses (1 a, 1 b) of the other embodiments inthat an island-like transparent pattern 29 c (i.e., a processed pattern)formed as an ornamental pattern, logo, character or the like islaminated above the antireflection film 15, and other configurations areidentical to those of the first embodiment.

Compared to the transparent patterns formed in both the first embodimentand the second embodiment, the transparent pattern 29 c is arrangedcloser to the surface of the optical lens 1 c. Thus, it is preferredthat the transparent pattern 29 c is formed of a material having lowrefractive index, such as silica dioxide (SiO₂) which is excellent inabrasion resistance. Like the other embodiments, the transparent pattern29 c has a film thickness which is suitably adjusted based on both therefractive index of the material constituting the transparent pattern 29c and the required visibility of the transparent pattern 29 c whenviewed from the side of the water-repellent film 17; and further, likethe other embodiments, the transparent pattern 29 c may also be formedby laminating a plurality of different material layers one upon another.Note that, in the case where the transparent pattern 29 c has alaminated structure, it is preferred that the top layer portion of thetransparent pattern 29 c is configured by a material having lowrefractive index, such as silica dioxide (SiO₂) which is excellent inabrasion resistance.

<Method for Producing Optical Lens of Third Embodiment>

FIG. 8 is a flowchart showing a producing procedure of the optical lensof the third embodiment having the aforesaid configuration. FIGS. 9A,9B, 10A and 10B are producing process drawings showing the producingprocedure of the optical lens of the third embodiment having theaforesaid configuration. The feature of the producing procedure of theoptical lens of the third embodiment will be described below withreference to these drawings, in the case where the optical lens isapplied to spectacles.

[FIG. 9A]

First, the same process as shown in FIGS. 3A to 3C of the firstembodiment is previously performed to form reference marks (m1 to m4),which are not shown here in FIG. 9A, on the side of the one principalsurface of the lens substrate 11 (S11). Thereafter, the hard coat film13 is formed on the one principal surface of the lens substrate 11(S12), then a modification treatment for ensuring wettability of thesurface of the hard coat film 13 is performed (S13), and then theantireflection film 15 with a multi-layer structure is formed (S14).

The aforesaid film-forming processes and modification treatment areperformed in the same manner as the first embodiment, and the hard coatfilm 13 is formed by, for example, a dipping method using a solutionhaving an organosilicon compound dissolved therein. As the modificationtreatment of the surface of the hard coat film 13, a plasma treatmentusing oxygen plasma, for example, is performed. Further, theantireflection film 15 is formed by performing ion assisted depositionto thereby form respective layers one upon another, with eachcomposition and each film thickness, in the order from the lowrefractive index film 15 a-1, which is arranged on the side of theunderlying layer, to the low refractive index film 15 a-7. However,considering that the transparent pattern is to be laminated, the filmthickness of the low refractive index film 15 a-7, which is the toplayer of the antireflection film 15, may also be adjusted separately.

[FIG. 9B]

Next, as shown in FIG. 9B, the masking layer 21 is pattern-formed abovethe low refractive index film 15 a-7 of the antireflection film 15using, for example, the same inkjet method as is used in the firstembodiment (S15). Similar to the first embodiment, the masking layer 21formed here covers the entire contour shape of the lens, and has anaperture pattern 21 a that corresponds to the transparent pattern formedon the optical lens, wherein the contour shape is established on theside of the one principal surface of the lens substrate 11. Further,similar to the first embodiment, the ink used in the inkjet method is,for example, a UV cure ink possible to be removed by being dissolved inethanol, acetone or the like after being cured.

Incidentally, the modification treatment for ensuring wettability of thesurface of the antireflection film 15 may also be performed before themasking layer 21 has been formed. The modification treatment isperformed by a proper method. Further, similar to the first embodiment,after the masking layer 21 has been formed using the inkjet method,ultraviolet light (UV) is irradiated on the masking layer 21 to therebycure the UV cure ink constituting the masking layer 21.

[FIG. 10A]

Next, as shown in FIG. 10A, a transparent material film is formed fromabove the masking layer 21 (S16). By performing such step, afilm-forming treatment is selectively performed with respect to thesurface of the antireflection film 15 exposed from the bottom of theaperture pattern 21 a of the masking layer 21. Here, an evaporationmethod is used to form the transparent material film 29 at apredetermined film thickness (for example, 10 nm), wherein thetransparent material film 29 is formed of silica dioxide (SiO₂) and hasa refractive index of 1.43 to 1.47, for example. When forming film, anion assisted deposition is performed necessary according to necessity tothereby form the transparent material film 29 with excellentfilm-quality and adhesion.

[FIG. 10B]

Thereafter, as shown in FIG. 10B, a treatment is performed to remove themasking layer 21 from above the antireflection film 15, so that thetransparent material film 29 above the masking layer 21 is selectivelyremoved along with the masking layer 21 (S17). Here, the masking layer21 is removed by performing, for example, a wet process using a solvent(ethanol, acetone or the like) to dissolve the ink constituting themasking layer 21, so that the transparent material film 29 above themasking layer 21 is selectively removed along with the masking layer 21.By performing such process, only the part of the transparent materialfilm 29 formed within the aperture pattern 21 a of the masking layer 21remains on the lens substrate 11 through the hard coat film 13 andantireflection film 15, and the remaining part of the transparentmaterial film 29 is formed as the transparent pattern 29 c on the lenssubstrate 11. The transparent pattern 29 c formed in such manner isformed at the same position and with the same shape as the aperturepattern 21 a formed in the masking layer 21.

[FIG. 7A, FIG. 7B]

Thereafter, as shown in FIGS. 7A and 7B, the water-repellent film 17 isformed onto the antireflection film 15 in a state where the transparentpattern 29 c is covered (S18). Next, the lens substrate 11, which hasvarious layers up to the water-repellent film 17 formed thereon, isshape-cut to match the contour shape F determined with respect to thelens substrate 11 (S19). At this time, similar to the process describedin the first embodiment, the lens substrate 11 is shape-cut to match thecontour shape F, which is aligned based on the reference marks m1 to m4formed outside the contour shape F of the lens substrate 11.

<Advantages of Third Embodiment>

In the aforesaid method for producing the optical lens according to thethird embodiment, as described with reference to FIG. 10A, by performingthe film-forming treatment from above the masking layer 21, thetransparent pattern 29 a, as a processed pattern, is formed on thebottom of the aperture pattern 21 a of the masking layer 21. Thus,similar to the first embodiment, it is possible to form the transparentpattern 29 a, as a processed pattern with high accuracy, at apredetermined position on the lens substrate 11, wherein the transparentpattern 29 a is formed of a material which is though not suitable to beused to form a pattern by high-accuracy pattern-forming methods such asan inkjet method, for example, but is suitable to be used to form a filmby film-forming methods such as an evaporation method.

Similar to the configuration of the optical lenses of the otherembodiments, in the optical lens 1 c of the third embodiment obtained inthe aforesaid manner, the transparent pattern 29 c is also laminatedonto the antireflection film 15, which has a multi-layer structure.Thus, similar to the other embodiments, by using the optical lens 1 c,it is possible to configure a pair of spectacles excellent in design byforming the transparent pattern 29 c as an ornamental pattern, logo,character or the like, wherein the transparent pattern 29 c can beviewed from outside while the field of vision of the wearer can beensured without discomfort.

The third embodiment is described based on a configuration in which theisland-like transparent pattern 29 c is laminated onto theantireflection film 15; however, a transparent pattern having anaperture, like the transparent pattern of the second embodiment, mayalso be used as the transparent pattern to be laminated onto theantireflection film 15; in such a case, the same advantages as the thirdembodiment can be obtained.

Further, the aforesaid first to third embodiments are described based ona configuration in which the transparent pattern is laminated above orbelow the antireflection film 15; however, the transparent pattern mayalso be arranged between the layers of the antireflection film 15, whichhas the multi-layer structure. In such a case, like the otherembodiments described above, the transparent pattern has a filmthickness which is suitably adjusted based on both the refractive indexof the material constituting the transparent pattern and the requiredvisibility of the transparent pattern when viewed from the side of thewater-repellent film 17, and further, like the other embodimentsdescribed above, the transparent pattern may also be formed bylaminating a plurality of different material layers one upon another.

4. Fourth Embodiment <Configuration of Optical Lens According to FourthEmbodiment>

FIGS. 11A and 11B are views for explaining the configuration of anoptical lens 1 d according to a fourth embodiment, wherein FIG. 11A is aplan view, and FIG. 11B is a cross section taken along line a-a′ of FIG.11A. The optical lens 1 d of the fourth embodiment shown in thesedrawings differs from the optical lenses (1 a to 1 c) of the first tothird embodiments in that an island-like dyed pattern 31 d is providedas a processed pattern, and other configurations are identical to thoseof the first embodiment.

To be specific, assuming either the concave surface or the convexsurface is one principal surface, the dyed pattern 31 d, which isprovided as a processed pattern, is arranged in the surface layer on theside of the one principal surface. The depth d of the dyed pattern 31 din the surface layer and the concentration of the dye of the dyedpattern 31 d are suitably adjusted based on the required visibility ofthe dyed pattern 31 d when viewed from the side of the water-repellentfilm 17. Particularly, it is preferred that the depth of the dyedpattern 31 d and the concentration of the dye of the dyed pattern 31 dare adjusted so that the dyed pattern 31 d is not easily viewed in thecase where the optical lens 1 d is used to form a pair of spectacles andwhere the optical lens id is viewed at a very close distance from theside opposite the water-repellent film 17.

The dye that constitutes such dyed pattern 31 d may be a materialcapable of dyeing the lens substrate 11, which is formed of a plasticmaterial; and a proper material is used as the dye depending on thedyeing method for forming the dyed pattern 31 d. For example, in thecase where a sublimation dyeing method is used to dye the lens substrate11 to form the dyed pattern 31 d, a sublimation dye will be used as thedye. Further, in the case where a dipping method is used to dye the lenssubstrate 11, a dye adapted for dipping method will be used.

A hard coat film 13, an antireflection film 15 with a multi-layerstructure, and a water-repellent film 17, each film having the sameconfiguration as that of the other embodiments, are laminated in thisorder to the one principal surface of the lens substrate 11 to which theaforesaid dyed pattern 31 d is provided.

<Method for Producing Optical Lens of Fourth Embodiment>

FIG. 12 is a flowchart showing a producing procedure of the optical lensof the fourth embodiment having the aforesaid configuration. FIGS. 13A,13B, 14A, 14B and 14C are producing process drawings showing theproducing procedure of the optical lens of the fourth embodiment havingthe aforesaid configuration. The feature of the producing procedure ofthe optical lens of the fourth embodiment will be described below withreference to these drawings, in the case where the optical lens isapplied to spectacles.

[FIG. 13A, FIG. 13B]

First, as shown in the plan view of FIG. 13A and the cross sectionalview of FIG. 13B (equivalent to a cross section taken along line a-a′ ofFIG. 13A), the lens contour shape F of the lens substrate 11 isdetermined, and the reference marks m1 to m4 are formed on the side ofthe one principal surface of the lens substrate 11 (S21), wherein thereference marks m1 to m4 serve as a reference of the contour shape F.Such step is performed in the same manner as has been described in thefirst embodiment with reference to FIGS. 3A to 3C.

Next, a modification treatment is performed for the surface on the sideof the one principal surface of the lens substrate 11 (S22). As themodification treatment, a treatment for ensuring wettability of thesurface of the lens substrate 11 with respect to the ink to be used forforming the masking layer in the next step is performed. Here, as atreatment method that does not cause damage to the surface of the lenssubstrate 11, a plasma treatment using an oxygen plasma, for example, isperformed. Incidentally, the modification treatment for ensuringwettability does not have to be limited to the plasma treatment, but mayalso be other methods as long as such methods do not caused damage tothe lens substrate 11; for example, an ion irradiation treatment, acorona discharge treatment or the like may be performed as themodification treatment.

Next, regarding the lens substrate 11 having been subjected to themodification treatment as a base, an inkjet method is used topattern-form the masking layer 21 on the surface of the base with thesame step as has been described in the first embodiment (S23). Here,similar to the first embodiment, it is important to print and form themasking layer 21 by using an inkjet method so that the aperture pattern21 a is arranged at a predetermined position of the lens substrate 11preset based on the previously-created reference marks m1 to m4, withoutbeing affected by the curve of the lens substrate 11.

[FIG. 14A]

Next, as shown in FIG. 14A, a dyeing process of the lens substrate 11 isperformed from above the masking layer 21 (S24). By performing suchstep, a dyeing process is selectively performed with respect to thesurface of the lens substrate 11 exposed from the bottom of the aperturepattern 21 a of the masking layer 21. Here, a sublimation dyeingprocess, for example, is performed. In such a case, for example, a printsheet obtained by coating an ink on a substrate is prepared, wherein theink is obtained by dispersing a sublimation dye into an aqueous medium.The print sheet is arranged so that the ink-coated surface of the printsheet faces the surface of the lens substrate 11 on which the maskinglayer 21 is to be formed, and the print sheet is heated in apredetermined reduced-pressure atmosphere. Thus, the sublimation dye ofthe print sheet is sublimated, so that the portion of the lens substrate11 exposed from the bottom of the aperture pattern 21 a of the maskinglayer 21 is dyed. At this time, the masking layer 21 is also dyed, butthe portion of the lens substrate 11 covered by the masking layer 21 isnot dyed. Consequently, the dyed pattern 31 d, which is obtained bydyeing the surface layer of the lens substrate 11, is formed only in thebottom portion of the aperture pattern 21 a. The dyed pattern 31 dformed in such manner is formed at the same position and with the sameshape as the aperture pattern 21 a formed in the masking layer 21.

Here, the dyeing process is performed in a manner in which the depth dof the surface layer of the lens substrate 11 and the concentration ofthe dye constituting the dyed pattern 31 d are controlled based on therequired visibility of the dyed pattern 31 d. The depth d and theconcentration of the dye in the dyeing process are controlled for eachmaterial of the lens substrate 11 by adjusting the concentration of thedye of the print sheet and the processing time of the dyeing process.

Incidentally, in the case where a dipping method is used, theconcentration can be controlled by adjusting the duration while the lenssubstrate 11 is dipped into a liquid dye, the temperature of the dye,and the like. Further, in the case where a dipping method is used, it ispossible to dye both the concave surface and the convex surface, and itis also possible to control the contrasting density of the masking imageby performing single-surface dyeing or both-surfaces dyeing.

[FIG. 14B]

Next, as shown in FIG. 14B, a process for remove the masking layer 21from the lens substrate 11 is performed (S25). Here, the dyed maskinglayer 21 is removed by performing, for example, a wet process using asolvent (ethanol, acetone or the like) that dissolves the masking layer21.

[FIG. 14C]

Next, as shown in FIG. 14C, the hard coat film 13 and the antireflectionfilm 15 are formed in this order on the lens substrate 11 on which thedyed pattern 31 d has been formed, and further, the water-repellent film17 is formed on the antireflection film 15, wherein the antireflectionfilm 15 has a multi-layer structure formed by alternately laminating thelow refractive index film 15 a and the high refractive index film 15 bone upon another (S26). The antireflection film 15 is formed byperforming ion assisted deposition to thereby form respective layers oneupon another, with each composition and each film thickness, in theorder from the low refractive index film 15 a-1, which is arranged onthe side of the underlying layer, to the low refractive index film 15a-7.

[FIG. 11A, FIG. 11B]

Thereafter, as shown in FIGS. 11A and 11B, the lens substrate 11, whichhas various layers up to the water-repellent film 17 formed thereon, isshape-cut to match the contour shape F determined with respect to thelens substrate 11 (S27). At this time, as shown in FIGS. 13A and 13B,similar to the process described in the first embodiment, the lenssubstrate 11 is shape-cut to match the contour shape F, which is alignedbased on the reference marks m1 to m4 formed on the lens substrate 11,so that the optical lens 1 d of the fourth embodiment is obtained.

<Advantages of Fourth Embodiment>

In the aforesaid method for producing the optical lens according to thefourth embodiment, as described with reference to FIG. 14A, byperforming the dyeing process from above the masking layer 21, the dyedpattern 31 d, as a processed pattern, is formed on the bottom of theaperture pattern 21 a of the masking layer 21. In other words, theprocessed pattern can be formed as the dyed pattern 31 d by performing adyeing process. Further, the dyed pattern 31 d (i.e., the processedpattern) is formed within the aperture pattern 21 a of the masking layer21. Thus, the dyed pattern 31 d (i.e., the processed pattern) with highshape accuracy can be obtained following the forming accuracy of themasking layer 21 by the inkjet method. As a result, the dyed pattern 31d, as an ornamental pattern, logo, character or the like, can be formedas a processed pattern possible to be viewed from outside, at apredetermined position on the surface layer of the lens substrate 11.

5. Fifth Embodiment <Configuration of Optical Lens According to FifthEmbodiment>

FIGS. 15A and 15B are views for explaining the configuration of anoptical lens 1 e according to a fifth embodiment, wherein FIG. 15A is aplan view, and FIG. 15B is a cross section taken along line a-a′ of FIG.15A. The optical lens 1 e of the fifth embodiment shown in thesedrawings is identical to the optical lens (1 d) of the fourth embodimentexcept that a dyed pattern 31 e is configured as a punched patternhaving an aperture h.

The dyed pattern 31 e having the aperture h may have the sameconfiguration as that of the island-like dyed pattern (31 d) describedin the fourth embodiment except for the planar shape. To be specific,the depth d of the dyed pattern 31 e in the surface layer and theconcentration of the dye of the dyed pattern 31 e are suitably adjustedbased on the required visibility of the dyed pattern 31 e when viewedfrom the side of the water-repellent film 17. Particularly, it ispreferred that the depth of the dyed pattern 31 e and the concentrationof the dye of the dyed pattern 31 e are adjusted so that the dyedpattern 31 e is not easily viewed in the case where the optical lens 1 eis used to form a pair of spectacles and where the optical lens 1 e isviewed at a very close distance from the side opposite thewater-repellent film 17.

<Method for Producing Optical Lens of Fifth Embodiment>

The method for producing the optical lens 1 e of the fifth embodimenthaving the aforesaid configuration is identical to that of the fourthembodiment. However, in the process for forming the masking layer 21described with reference to FIGS. 13A and 13B, a masking layer having areversed pattern may be formed by using an inkjet method.

<Advantages of Fifth Embodiment>

Since the same method as the fourth embodiment is applied to the fifthembodiment, the same advantages as the producing method of the fourthembodiment can be achieved by the fifth embodiment.

Although described in the aforesaid fourth embodiment and fifthembodiment is a configuration in which a dyeing pattern is formed on thesurface layer on the side of the one principal surface of the lenssubstrate 11 from above the masking layer 21 by a sublimation dyeingmethod, the dyeing pattern does not have to be formed by a sublimationdyeing method, but may also be formed by other methods such as a dippingmethod, a transfer method, or the like.

However, as described in the fourth embodiment and fifth embodiment, ina state where the masking layer 21 is formed only on the side of the oneprincipal surface of the lens substrate 11, if the dyeing process isperformed using a method in which the entire lens substrate 11 isexposed to the dye, such as a dipping method, the other principalsurface of the lens substrate 11 on which the masking layer 21 is notformed will be dyed. In such case, in order to form a dyeing pattern byperforming dyeing process from the side of the masking layer 21, it isimportant to perform dyeing in a manner in which dyeing conditions arecontrolled so that the dye from the side of the other principal surfacedoes not reach the side of the one principal surface on which themasking layer 21 has been formed. Alternatively, along with the side ofthe one principal surface of the lens substrate 11, the entire lensregion on the side of the other principal surface may be covered by themasking layer, so that when performing dyeing process, the side of theother principal surface of the lens substrate 11 can be prevented frombeing dyed.

The aforesaid first to fifth embodiments are described based on anexample in which the processed pattern is formed on a spectacle opticallens. However, the method for producing the optical lens according tothe present invention can be widely used to form a processed pattern asan ornamental pattern, logo, character or the like in a predeterminedlens region, instead of being limited to be used to produce a spectacleoptical lens.

Further, the aforesaid first to fifth embodiments are described based onan example in which the masking layer 21 is formed using an inkjetmethod. However, the masking layer 21 does not have to be formed usingthe inkjet method, but may also be formed by printing or by attaching atape. Even in such a case, by forming the masking layer 21 at accurateposition in accurate shape, a transparent pattern or dyeing patternconfigured by a transparent material film can be accurately formed on alens surface, without limiting the material.

EXPLANATION OF REFERENCE NUMERALS

-   -   1 a, 1 b, 1 c, 1 d, le optical lens    -   11 lens substrate    -   F contour shape (lens region)

m1, m2, m3, m4 reference mark

-   -   21 masking layer    -   19, 29 transparent material film    -   19 a, 19 b, 29 c transparent pattern (processed pattern)    -   31 d, 31 e dyed pattern (processed pattern)

1. A method for producing an optical lens comprising the steps of:forming a mark outside a lens region set in a lens substrate, whereinthe mark is adapted to perform position alignment; pattern-forming amasking layer above one principal surface of the lens substrate whilecontrolling formation position of the masking layer with the mark as areference, wherein the masking layer has an aperture at a predeterminedposition in the lens region; performing a selective process with respectto a surface exposed from the bottom of the aperture of the maskinglayer by performing a process from above the masking layer; and removingthe masking layer from above the lens substrate to form a processedpattern by the selective process on the side of the one principalsurface of the lens substrate.
 2. The method for producing the opticallens according to claim 1, wherein in the step of performing theselective process, a process for forming a transparent material film isperformed, and wherein in the step of removing the masking layer, byremoving the transparent material film formed on the masking layer alongwith the masking layer, a transparent pattern formed of the transparentmaterial film, as the processed pattern, is formed only on the surfaceexposed from the bottom of the aperture of the masking layer.
 3. Themethod for producing the optical lens according to claim 2, furthercomprising the step of: forming an antireflection film above the oneprincipal surface of the lens substrate either between the time when themark for performing position alignment has been formed and the time whenthe masking layer is pattern-foamed or after the time when the processedpattern has been formed.
 4. The method for producing the optical lensaccording to claim 1, wherein in the step of performing the selectiveprocess, by performing a dyeing process with respect to bottom of theaperture of the masking layer, a dyeing pattern is formed as theprocessed pattern.
 5. The method for producing the optical lensaccording to claim 4, further comprising the step of: forming anantireflection film above the one principal surface of the lenssubstrate after the dyeing pattern has been formed as the processedpattern.
 6. The method for producing the optical lens according to claim1, further comprising the step of: performing a modification treatmentwith respect to the surface of a base of the masking layer before thestep of forming the masking layer, wherein the modification treatment isadapted to ensure wettability of the base with respect to the inkconstituting the masking layer
 7. The method for producing the opticallens according to claim 1, further comprising the step of: cutting outthe lens region from the lens substrate on which the processed patternhas been formed.
 8. The method for producing the optical lens accordingto claim 1, wherein in the step of pattern-forming the masking layer,the pattern-forming is performed by an inkjet method.